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Yttria-Stabilized Zirconia Thermal Barriers Sprayed Using N
星级: 7 页
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Measurement of the reaction rate coefficients of reactions of H2 with Ne, Ar, Kr, Xe, H2, D2, N2 and CH4 at thermal energy
星级: 9 页
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Spectroscopic study of the decomposition process of tetramethylsilane in the N2–H2 and N2–Ar low pressure plasma
星级: 10 页
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Aerospace plane cooling with H2, CH4, He, Ne, N2, and Ar
星级: 7 页
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Plasma spraying using Ar-He-H2 gas mixtures
星级: 8 页
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In-Flight Spheroidization of Alumina Powders in Ar–H2 and Ar–N2 Induction Plasmas
星级: 17 页
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Plasma assisted chemical vapour deposition of boron nitride coatings from using BCl3–N2–H2–Ar gas mixture
星级: 13 页
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Excitation of Electronic States of Ar, H2, and N2 by Positron Impact激发电子态的Ar,H2,N2的正电子的影响
星级: 4 页
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silicides and nitrides formation in ti films coated on si and exposed to (ar-n2-h2) expanding plasma
星级: 14 页
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